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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">Journal of Communications Technology and Electronics</journal-id><journal-title-group><journal-title xml:lang="en">Journal of Communications Technology and Electronics</journal-title><trans-title-group xml:lang="ru"><trans-title>Радиотехника и электроника</trans-title></trans-title-group></journal-title-group><issn publication-format="print">0033-8494</issn><issn publication-format="electronic">3034-5901</issn><publisher><publisher-name xml:lang="en">The Russian Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">682390</article-id><article-id pub-id-type="doi">10.31857/S0033849424120078</article-id><article-id pub-id-type="edn">HNBCTN</article-id><article-categories><subj-group subj-group-type="toc-heading"><subject>НАНОЭЛЕКТРОНИКА</subject></subj-group><subj-group subj-group-type="article-type"><subject>Research Article</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Features of nonequilibrium pinning of charge density waves in compounds HoTe<sub>3</sub> and TmTe<sub>3</sub></article-title><trans-title-group xml:lang="ru"><trans-title>Особенности неравновесного пиннинга волны зарядовой плотности в соединениях HoTe<sub>3</sub> и TmTe<sub>3</sub></trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Voropaev</surname><given-names>D. M.</given-names></name><name xml:lang="ru"><surname>Воропаев</surname><given-names>Д. М.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><email>voropaev.dm@phystech.edu</email><xref ref-type="aff" rid="aff1"/><xref ref-type="aff" rid="aff2"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Frolov</surname><given-names>A. V.</given-names></name><name xml:lang="ru"><surname>Фролов</surname><given-names>А. В.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><email>voropaev.dm@phystech.edu</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Orlov</surname><given-names>A. P.</given-names></name><name xml:lang="ru"><surname>Орлов</surname><given-names>А. П.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><email>voropaev.dm@phystech.edu</email><xref ref-type="aff" rid="aff1"/><xref ref-type="aff" rid="aff3"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Sinchenko</surname><given-names>A. A.</given-names></name><name xml:lang="ru"><surname>Синченко</surname><given-names>А. А.</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><email>voropaev.dm@phystech.edu</email><xref ref-type="aff" rid="aff1"/></contrib></contrib-group><aff-alternatives id="aff1"><aff><institution xml:lang="en">Kotelnikov Institute of Radioengineering and Electronics of RAS</institution></aff><aff><institution xml:lang="ru">Институт радиотехники и электроники им. В.А. Котельникова РАН</institution></aff></aff-alternatives><aff-alternatives id="aff2"><aff><institution xml:lang="en">Moscow Institute of Physics and Technology (National Search University)</institution></aff><aff><institution xml:lang="ru">Московский физико-технический институт (национальный исследовательский университет)</institution></aff></aff-alternatives><aff-alternatives id="aff3"><aff><institution xml:lang="en">Institute of Nanotechnology of Microelectronics of RAS</institution></aff><aff><institution xml:lang="ru">Институт нанотехнологий микроэлектроники РАН</institution></aff></aff-alternatives><pub-date date-type="pub" iso-8601-date="2024-12-15" publication-format="electronic"><day>15</day><month>12</month><year>2024</year></pub-date><volume>69</volume><issue>12</issue><fpage>1191</fpage><lpage>1197</lpage><history><date date-type="received" iso-8601-date="2025-06-03"><day>03</day><month>06</month><year>2025</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2024, Russian Academy of Sciences</copyright-statement><copyright-statement xml:lang="ru">Copyright ©; 2024, Российская академия наук</copyright-statement><copyright-year>2024</copyright-year><copyright-holder xml:lang="en">Russian Academy of Sciences</copyright-holder><copyright-holder xml:lang="ru">Российская академия наук</copyright-holder></permissions><self-uri xlink:href="https://innoscience.ru/0033-8494/article/view/682390">https://innoscience.ru/0033-8494/article/view/682390</self-uri><abstract xml:lang="en"><p>In this paper, the similarity of glass systems with pinning in compounds with a charge density wave (CDW) TmTe<sub>3</sub> and HoTe<sub>3</sub> was investigated. For this purpose, the differential IVs in micro-bridge structures oriented along the sliding direction of the CDW, with a multi-stage temperature change, were studied. In such a system with a sliding CDW, the changing behavior of the threshold field during isothermal exposure was shown, with characteristic relaxation on a logarithmic time scale. A property characteristic of glass systems has been found – the memory effect, which allows us to assert the unusual glass nature of the system of pinning centers in this system.</p></abstract><trans-abstract xml:lang="ru"><p>Исследовано сходство стекольных систем с пиннингом в соединениях с волной зарядовой плотности (ВЗП) TmTe<sub>3</sub> и HoTe<sub>3</sub>. Измерены дифференциальные вольт-амперные характеристики в микромостиковых структурах, ориентированных вдоль направления скольжения ВЗП, при многоступенчатом изменении температур. Продемонстрировано изменяющееся поведение порогового поля в процессе изотермической выдержки в системе со скользящей ВЗП, с характерной релаксацией в логарифмическом масштабе времени. Обнаружено свойство, присущее стекольным системам – эффект памяти, что позволяет утверждать о необычной стекольной природе системы центров пиннинга ВЗП в данных материалах.</p></trans-abstract><kwd-group xml:lang="en"><kwd>Charge-density-waves</kwd><kwd>two-dimensional structures</kwd><kwd>memory effect</kwd></kwd-group><kwd-group xml:lang="ru"><kwd>волна зарядовой плотности</kwd><kwd>двумерные соединения</kwd><kwd>эффект памяти</kwd></kwd-group><funding-group><award-group><funding-source><institution-wrap><institution xml:lang="ru">Российский научный фонд</institution></institution-wrap><institution-wrap><institution xml:lang="en">Russian Science Foundation</institution></institution-wrap></funding-source><award-id>22-22-00331</award-id></award-group></funding-group></article-meta></front><body></body><back><ref-list><ref id="B1"><label>1.</label><mixed-citation>Grüner G. // Rev. Modern Phys. 1988. V. 60. № 4. 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